Dionex announces the release of the MMS 300 family of MicroMembrane Suppressors, with an improved regenerant screen design which lowers backpressure and increases dynamic capacity
These chemically regenerated eluent suppressors provide increased pressure tolerance over previous MMS suppressors, with a backpressure tolerance of 150psi for standard operation and a maximum leak tolerance up to 300psi.
The innovative regenerant sweep-out design provides low noise and fast startup.
The new shape is designed to fit all Dionex chromatograph enclosures.
These improved suppressors are available for anionic separations (AMMS 300) using hydroxide and carbonate/bicarbonate eluents, or cationic separations (CMMS 300) using methanesulphonic acid and sulphuric acid eluents.
MMS 300 suppressors are also recommended for suppression of eluents containing organic solvents.
The suppressors are available in a 4mm format (for use with 4- and 5mm columns) and a 2mm format (for use with 2- and 3mm columns).
Sulphuric acid is used to regenerate the AMMS 300 and tetrabutylammonium hydroxide is used to regenerate the CMMS 300.
Convenient regenerant concentrates are available from Dionex.
The chemical regenerant can be delivered using a pressurised bottle, a peristaltic pump, or the innovative displacement chemical regeneration (DCR) mode.
The DCR mode uses the effluent from the conductivity cell to displace regenerant, delivering regenerant to the suppressor at a flow rate equal to the eluent flow.
Because the IC system pump controls both the eluent flow and the regenerant flow, no additional pump is required.
Precise flow control assures a drift-free baseline.
The low regenerant flow rate maintained using the DCR mode reduces waste and cost.
And because regenerant and eluent are consumed at the same rate, regenerant and eluent bottles can be changed at the same time, leading to fewer interruptions to operation.
