Olympus has introduced the MPLAPON series of plan apochromatic objectives, which provide chromatic aberration correction for materials imaging.
Completing the Olympus UIS2 objective range, the MPLAPON objectives are available in 50 and 100x magnification.
Developed to provide excellent brightfield imaging, including DIC, the MPLAPON objectives feature numerical apperatures of 0.95 and are fully compatible with active auto-focusing units.
As a result, highly resolved images are said to be obtained easily, making the MPLAPON series suitable for inspecting minute areas in industrial-imaging samples, such as semiconductor patterns.
The high-resolution capabilities of the MPLAPON objectives enable individual imaging and observation of points separated by 0.35um.
With correction for chromatic aberrations over a broad wavelength range, these plan objectives provide flat and accurately focused wide-field images.
Olympus has developed the wavefront-aberration-control process and implemented it into the production of the MPLAPON objective range.
With this measurement device, small aberrations not visible to the human eye can be quantitatively measured and eliminated to produce advanced, high-quality objectives.
As a result, these precision objectives enable strehl ratios of at least 95 per cent.
