XEI Scientific has announced that with the final shipments of 2010, they have fulfilled orders bringing the total number of Evactron systems delivered to more than 1,000 units worldwide.
According to XEI, the Evactron in situ plasma cleaning solution is now seen as the standard for removal of hydrocarbon-based contamination in a large variety of vacuum systems around the world.
Offered for nearly all makes of electron microscopes, dual-beam FIBs and other imaging tools with clean vacuum requirements, this safe technology has provided cost-effective contamination removal for demanding imaging and metrology applications.
The Evactron has always come with a guarantee protecting the users from any damage to sensitive chamber components such as X-Ray detector windows, but the company have never had to repair or replace any components damaged by the Evactron cleaning process.
Currently, XEI is introducing the in situ technology for use in Transmission Electron Microscopy by means of the TEM WandT.
Further, new applications where extremely clean surfaces are critical such as EUV Lithography, synthesis of novel nanomaterials or operations by nanomanipulators continue to expand the potential uses of the XEI technology.
