The Hiden HPR-30 differentially-pumped mass spectrometer enables real-time measurement and control of gas composition in vacuum processes.
Operating in the pressure regime 1mbar to 10E-4mbar, the spectrometer addresses multiple process areas including vacuum coating, plasma etching, sputter deposition, CVD/MOCVD and RIE.
The system mounts directly to the process chamber with the close-coupled re-entrant sample extractor tube inserted directly into the process environment for fastest response to status changes in the gas composition.
The integral differential turbo-molecular pump ensuring the mass spectrometer(MS) continues to operate within a UHV environment through process pressures up to 1mbar.
Alternatively, the HPR-30 can be cart-mounted with remote process system coupling for qualitative gas analysis and for leak detection.
The HPR-30 is fully PC controlled and programmable for automatic operation and data reporting.
Multiple input channels enable process data such as process pressure, temperature and feed-gas admission/shutoff status to be fully integrated with the acquired mass spectra.
