New vacuum coating system for research into substrates offers increased productivity and flexibility for thin film deposition processes
BOC Edwards has added to its range of vacuum coating systems for thin film deposition processes.
The TF600 combines a 600mm wide coating chamber with a high throughput vacuum pumping system.
The system is designed to deliver increased productivity and flexibility for those responsible for the research, development and production of substrates used in the semiconductor, laser and scientific industries.
The TF600 has several new design features, such as the placement of the high vacuum pumping system at the rear of the chamber, to provide faster pumpdown.
Pumping system options include diffusion, turbomolecular, and cryogenic high vacuum pumps, and the XDS 35i dry scroll pump for backing and chamber roughing.
Every TF600 system is custom built to the user's specific requirements.
Process options include resistance evaporation, electron beam, RF, DC and pulsed DC sputtering.
With a variety of chamber heights, loadlock options and multiple source configurations, the TF600 allows users to address a wide range of applications and specialist techniques such as lift off and ion beam processing.
The TF600 joins BOC Edwards's range of highly successful thin film systems, which include Temescal electron beam systems.
Also available is the entry level Auto 306 evaporator and the versatile Auto 500, which offer additional chamber and deposition options.
