Elite Thermal Systems has designed and manufactured a system for annealing indium wafers under clean room conditions for use in opto-electronics
The system is centred around an Elite oven that has a maximum temperature of 500C.
The oven incorporates a 110mm reaction tube with a 600mm heated length.
Elite designed a special carrier assembly to insert the wafers into the heated zone of the system. The carrier is passed into the heated zone of the reaction vessel by a gas tight manual push-pull rod mechanism.
They are then processed under a high purity hydrogen/nitrogen gas mixture controlled by flow meters and micro filters.
Loading and unloading of the wafers onto the carrier assembly is facilitated by a precision slide assembly, which allows the whole carrier slide and push rod assembly to be withdrawn clear of the reaction tube.
Alf Roberts, managing director of Elite said, "This was a challenging project due to the need to keep a clean and pure environment for the wafer.
"We are producing many more innovative designs to meet the needs of the opto-electronics market that have a very high degree of precision and sophistication".
Elite produces a range a standard ovens and furnaces up to 2000C, which are suitable for many applications. Where specific thermal process characteristics are required, Elite will design a custom solution to meet the needs of the system
