Semiconductor manufacturing advances year-on-year in order to handle the increasing complexity of micro electronic components, and microscopes play a key role in the detection of process failures
The new Olympus MX61 semiconductor inspection microscope for 200/300mm wafers is said to improve process inspection by increasing the failure detection rate.
Automatic optimisation of contrast coupled with an intuitive and easy to use interface minimises errors and reduces the variation of results between operators, says the company.
Moreover, a high degree of modularity and a small footprint make the microscope the most flexible in its class.
Semiconductor manufacturing processes are advancing year-on-year in order to handle the increasing complexity of micro electronic components and the demands for higher production efficiency.
Microscopes play a key role in the detection of process failures before they become a serious problem.
Maximising efficiency from the beginning, the MX61 is designed to maximise inspection efficiency within a small footprint, thus making it easy to create cost-effective and practical workplaces.
The slim frame reduces the transfer distance from wafer handling systems to the microscope stage, which increases throughput and minimises the contamination risk.
In addition, the chance of foreign particle deposition is reduced further by a special anti-static treatment and a sealed motorised revolving nosepiece.
The MX61 is carefully designed and can be adjusted to suit all users, with important controls, including the focussing wheels, close together at the front of the microscope.
Contrast and resolution are automatically optimised by a novel aperture stop, which opens or closes when objectives are changed.
Moreover the specially developed light source in combination with the new M Plan fluorite objectives double the contrast when using dark-field compared to other microscopes in its class.
These innovative features not only make the detection of failures quicker and easier but also more comfortable for the user, says Olympus.
This ensures reliable and constant inspection results and minimises the variation between different operators.
Easy adaptation to changing inspection needs Thanks to its unique modular design concept and the integrated communication interface, the MX61 adapts effortlessly to changing needs - increases in automation throughput, higher resolution or a different contrast technique.
Retrofitable modules are available for real time auto focus, automatic wafer handling, spinning disc confocal, fluorescence, and infrared transmitted light microscopy.
