Ultravolt has developed the MMS-EB series of configurable high-voltage power systems for electron-beam applications.
MMS-EB offers stability and low noise, and will be available with PPM level temperature coefficient, ripple, regulation and stability.
The series will be configurable as three-, four-, or five-bias electron gun high-voltage power supplies for beam, filament, extractor, suppressor, and lens voltages.
The initial design will utilise off-the-shelf high-voltage power supply (HVPS) modules and accessories from 0 to 62VDC to 40kVDC at 0 to 4W to 30W.
All MMS-EB series systems contain a quiet, isolated hot deck featuring low common-mode noise rated for up to 15kV beam supplies and 40kV bias supplies on the beam.
Higher beam voltages will be available in the future.
The systems offer precision in a standard-product power supply: outputs at <25ppm to <10ppm temperature coefficients per degC, <10ppm to <5ppm load regulation and line regulation, and <200ppm to <1ppm ripple.
MMS-EB high-voltage power supply systems can operate in half-quiet mode, which latches HVPS programming DACs while permitting ADCs to monitor HVPS outputs.
When the system operates in full-quiet mode, HVPS programming DACs are latched and ADC multiplexers stop.
The size, weight and design enable the MMS-EB system to be mounted within 24in of the E-beam gun.
