Quantachrome Instruments announces a new method for determining pore size and pore volume distribution in thin-film low-k dielectrics.
The new method for determining pore size and pore volume distribution in thin-film low-k dielectrics overcomes the costs usually associated with previously applied techniques such as small angle x-ray and neutron scattering (Saxs and Sans), electron microscopy and NMR-methods.
A new, yet simple, approach takes advantage both of the extreme sensitivity of Quantachrome's gas adsorption instrument (Autosorb-1MP) to measure a sample's behavior of cryogenic krypton gas adsorption, and state-of-the-art density functional theory calculations to create a calibration database.
A whitepaper describing the development of the method is available.
Quantachrome expects this method to be widely adopted since it can be used with instruments already in use.
