A new brochure details the range of mass spectrometer products developed by Hiden for vacuum-process applications under diverse pressure regimes, from sub-atmospheric to ultra-high vacuum.
The application-specific systems are configured for monitoring, controlling and analysing varied processes related to thin-film deposition, plasma and ion-beam etching, and thermal reaction and desorption processes.
Systems are available for real-time measurement of gas composition and of positive and negative plasma-ion species and ion energies, supplied fully engineered with a dedicated process interface.
Applicable process techniques include ALD, CVD and MOCVD, MBE, RIE and IBE/RIBE.
Combined secondary ion and secondary neutral mass spectrometers (SIMS/SNMS) provide post-process quantitative measurement of product surface and subsurface composition.
These systems are supplied as complete workstations and also in component form for the upgrade of existing UHV surface-analysis tools.
