SEM allows measurement of sensitive materials in semiconductor and materials applications.
FEI is increasing its offering in the high-resolution scanning electron microscopy (SEM) market with the launch of the new Verios XHR SEM.
The Verios provides the sub-nanometer resolution and enhanced contrast needed for precise measurements on beam-sensitive materials in advanced semiconductor manufacturing and materials science applications.
“The Verios XHR SEM extends the lifetime of SEM as an important measurement tool in semiconductor process control labs by allowing engineers to measure beam-sensitive materials and structures that are too small for conventional SEM,” stated Rudy Kellner, vice president & general manager, Electronics Business Unit, FEI.
The Verios is the second generation of FEI’s leading XHR SEM family.
At low kV, where the performance of conventional SEM degrades significantly, the Verios system’s advanced optics deliver sensitivity to surface detail.
It allows any user to switch quickly between various operating conditions, maintain sample cleanliness, and obtain sub-nanometer resolution at any accelerating voltage from 1 kV to 30 kV.
