Oxford Instruments is holding a 2 day seminar on nanoscale systems at IISc Bangalore, India on 20th – 21st November 2012.
The seminar will cover nanoscale processing, materials characterisation, surface science and cryogenic environments.
This is the first time that Oxford Instruments has held such an event in India, which will comprise a full programme of talks by specialists within their scientific area.
Two parallel sessions will focus on key areas of expertise for Oxford Instruments, ‘Thin film processing’, and ‘Materials characterisation, surface science and cryogenic environments’.
‘Thin film processing’ workshop presentation topics will include:
- Deep silicon etch - MEMS, ALD and silicon
- III-V
- Deposition for compound semiconductor processing
- Plasma modelling and validation - ion densities, minimum ion energies
- ICT etch
- Nanotechnology
- Different frequencies in plasma processing
- Plasma processing hints and tips
- Molecular beam epitaxy
‘Materials characterisation, surface science and cryogenic environments’ presentation topics will include:
- Cryogenic environments and applications: Ultra-Low-Temperature (< 1 Kelvin) , superconducting magnets, software and measurement system capability
- Using Nano-manipulators for surface characterisation and TEM sample preparation; including live demonstrations and hands on training.
- Characterisation techniques such as EDS, thin film analysis using EDS including thin film ID technique details and demonstration
- Ultra-High-Vacuum scanning probe microscopy
- Electron spectroscopy for chemical analysis
- Photoemission on heterogeneous Graphene
