Versa 3D DualBeam offers an analytical mode, with beam currents up to100nA, and imaging with a resolution of 1.4nm.
FEI has added patented UniColore (UC) monochromated electron source to its Versa 3D DualBeam system.
According to the company, UC technology improves the DualBeam’s ability to image fine surface detail at low accelerating voltages without compromising its analytical performance at high voltages and beam currents.
“Versa 3D is now the only DualBeam to combine the low-voltage imaging performance of a monochromated FEG source with the versatility and ease-of-use of a non-immersion objective lens,” said Andre Mijiritskii, director product marketing for SEM and DualBeams.
“As a result, it can provide high-resolution images of fine surface detail on the widest range of specimens, including non-conductive, magnetic and light-element materials, and large or odd shaped samples.
“The same instrument can provide the high currents and voltages needed for fast, precise analysis. The non-immersion lens performs well at longer working distances that are particularly valuable for analysis and automated procedures, such as serial slice and 3D reconstruction and TEM sample preparation.”
The UC source improves imaging resolution at low accelerating voltages by decreasing the energy spread among beam electrons, which reduces chromatic aberration and permits the beam to be focused into a smaller spot on the sample surface.
Given a sufficiently small spot, image resolution and sensitivity to surface detail are further enhanced at low beam voltages by the reduction of beam penetration and scattering.
Low-voltage imaging can also eliminate charging effects that interfere with imaging on non-conductive materials.
