OES for semiconductor process control has advanced end point detection for plasma etch and chemical vapour deposition applications
Jobin Yvon has announced the latest addition to its semiconductor process control range.
The Digiscope is a sophisticated multichannel optical emission spectrometer (OES) with advanced end point detection for plasma etch and chemical vapour deposition (CVD) applications.
The system features a Jobin Yvon imaging spectrograph coupled to a 2048 pixel CCD detector.
These high quality optics, combined with enhanced digital signal filtering provide a high dynamic range, sensitive OES system.
In addition to providing accurate endpoint solutions on processes with very low exposed areas (<0.2%), it can also provide valuable plasma and chamber condition information, for example plasma composition and impurities.
The system is highly portable with an integral keyboard and flat panel display.
Alternatively, it can be supplied as an integratable version for embedding by plasma etcher manufacturers.
The systems can be networked together to provide cluster tool control via a single user interface.
