Addition of high-performance quadrupole secondary ion monitor specifically designed for optimum sensitivity for surface analysis and depth profiling applications for a wide range of materials
The Hiden Analytical UHV surface analysis system range is further extended by the addition of Maxim, a high-performance quadrupole secondary ion monitor specifically designed for optimum sensitivity for surface analysis and depth profiling applications for a wide range of materials including polymers, superconductors, semiconductors, alloys and dielectric, with measurement of trace components to sub-ppm levels.
Maxim features a ten-fold increase in detection capability to 10e6 counts per second per nanoamp for argon-aluminium, mass range options from 300amu to 1000amu and detection of both positive and negative ions through a dynamic range of seven decades.
An internally generated raster scan is used for primary beam deflection which, together with the synchronous data acquisition facility, enables precise surface mapping.
The acquisition region is additionally user-definable and software-selectable within the total raster area for depth profile studies.
Maxim systems are offered to supplement existing user surface analysis stations and, together with a selection of primary excitation sources, provide a complete Sims facility.
Additionally Maxim is offered fully integrated in a cost-effective UHV Sims workstation complete with sample manipulator, load lock/sample transfer mechanism and full vacuum and bakeout services with capacity for sample sizes to 50mm.
