P2i , the nanoscale enhancer of products using its proprietary cold plasma ion-mask process, is setting its sights on the pharmaceutical and biotech sectors
Initial trials on a range of laboratory consumables from pipette tips, to microplates and disposables have produced dramatic results, improving sample recovery and enhancing the non-binding properties of the surfaces.
"Laboratory work, especially in medical and forensic diagnostics, calls for the analysis of minute samples", explains P2i's technical director Stephen Coulson.
"Residual retention not only affects the accuracy of test results but, with many reagents being extremely costly, there are economic implications as well.
"In tests, pipette tips enhanced with ion-mask proved more accurate and reliable with reagent wastage costs reduced by up to ten percent.
"We are discovering new applications for ion-mask enhancement by the day and are already in discussion with a number of leading names in the biotech sector who are keen to see how ion mask can improve their products," adds Coulson.
Ion mask works by applying a protective layer just nanometres thick over the entire surface of a product by means of an ionised gas or plasma.
This layer is molecularly bound to the surface and will not leach away.
This transforms the surface of the product to display ultra low surface energy values down to one third that of PTFE (Teflon), displaying low liquid retention properties; while leaving the other properties of the product unchanged.
Both the inside and outside surfaces are enhanced, reducing binding and liquid loss while maximising sample recovery.
Treated items display enhanced repellency to a wide variety of reagents, virtually eliminating liquid retention.
P2i was established in 2004 to commercialise super liquid-repellent treatments developed by the UK Ministry of Defence.
Now on a commercial scale, P2i's enhancement process can be applied to a wide range of products in the medical, bioscience, electronics, automotive and aerospace and fashion accessories markets.