The MFC pressure insensitive mass flow controller from MKS instruments is designed to offer process reliability and device flexibility for all gas delivery applications.
The MFC includes improvements in functionality and performance to help users in semiconductor and high purity thin film applications increase tool throughput and reduce overall system costs.
Real-time accurate flow control that is insensitive to upstream and downstream pressure disturbances is provided through advanced digital algorithms.
By enabling real-time control of process gas flow, accuracy and repeatability is improved over conventional PID-based digital MFCs, resulting in better chamber matching.
To reduce the amount of MFCs in inventory, users are able to access specific MFC gas calibrations and flow ranges from up to 31 stored gas tables, configuring the MFC straight off the shelf.
The gas selection and full-scale range can be selected by the user via the included web browser.
The instrument is available from John Morris Scientific.
