Spectro showcased an improved version of the Spectro Genesis at Pittcon 2009 (8 - 13 March, Chicago).
The CCD-based ICP-OES Spectro Genesis is available with either radial or axial plasma observation.
Genesis is suited to routine environmental and industry elemental analysis applications.
It records the element spectrum between 175 and 777 nanometres for every analysis and features simultaneous measuring technology.
The Spectro Genesis now runs with the new Smart Analyzer Vision 4.0.
One benefit of this software is an integrated feature for specification testing.
Olaf Schulz, product manager for ICP-OES at Spectro, said: 'For every measurement, the Spectro Genesis automatically verifies whether or not the analysis is within the given specifications.
'If not, the analysis is marked accordingly.' Additional functions also streamline the work for users that develop their own methods on the Spectro Genesis.
The instrument now includes a function for automatic peak and background positioning.
Improvements to the Spectro Genesis instrument hardware include the high-voltage supply used in the Spectro Arcos, which provides reliable operation and increased system stability.
