The Beckman Coulter Delsanano's ability to measure the zeta potential of both suspensions and surfaces has been cited in a patent application by Hitachi Chemicals for its CMP slurry for silicon films.
Hitachi, with the help of the Delsanano system, has produced a CMP slurry that helps to decrease costs and improve yields when controlling the the size and surface characteristics of the polishing material and substrate.