XEI Scientific's new Evactron Combiclean system simplifies the control and operation of plasma radical sources for both the column and desktop cleaning of specimens for electron columns.
With more than 1,100 Evactron decontamination systems in use primarily on electron columns (such as scanning electron microscopes), the company is expanding the applications of its downstream plasma cleaning technology.
Earlier this year, XEI introduced the Evactron Softclean chamber, which allows users to mount Evactron plasma radical sources (PRSs) onto a desktop vacuum chamber to provide the same effective removal of problematic hydrocarbon contamination from samples, holders and other parts before they are placed in the electron column.
Using radio frequency and a patented hollow cathode electrode, Evactron systems produce a plasma that is contained in the PRS module.
Reactive gas radicals are generated and drawn into the sample chamber where they chemically break down unwanted hydrocarbon molecules into smaller constituents that are then removed by the instrument's vacuum system.
At the Microscopy and Microanalysis meeting in Nashville, Tennessee, on 7-11 August, the company will introduce the Evactron Combiclean system, which is designed to simplify the control and operation of multiple PRS modules on columns and desktops.
With a new integrated controller and vacuum chamber, operators can select which PRS is active via the system front panel and switch between the column cleaning and desktop decontamination of parts destined for use in the microscopes.
Other benefits include multiple insertion ports for cleaning microscope sample holders.
The cleaning chamber may function as a secure, long-term storage container for decontaminated samples.
It has a large circular lid for access to insert samples, while dry nitrogen purging prevents back streaming after plasma cleaning and during sample storage to allow the use of rotary vane pumps.
