Helios NanoLab HP platform enables expedited process development and helps chipmakers improve yield ramp.
FEI has launched the Helios NanoLab DualBeam systems for engineers that need to make process improvement decisions.
The 450HP and 1200HP DualBeam systems include new capability that meets the critical requirements for semiconductor process development at the 28nm device geometry node and below.
The Helios NanoLab 450HP and 1200HP DualBeam systems can prepare 15nm thick samples with less than a 2nm damage layer in 90 minutes, two times faster than competitive alternatives.
The iFast automation software claims to maximise ease-of-use while ensuring consistency among multiple operators and systems.
QuickFlip grid holders facilitate inverted sample preparation to improve sample quality while maintaining high throughput. Cell Navigation software allows automated navigation within non-unique memory arrays that can locate a single designated bit cell in a 50nm lateral field.
