Henniker Scientific has released a range of multi-technique deposition systems for nano-materials research.
The family of systems claims to offer the flexibility of several techniques in a single chamber.
Each system features a universal ‘quick-change’ source flange which can be configured for specific deposition techniques or combination of techniques including magnetron, thermal, e-beam or combination sources.
In addition, each system configuration has a wealth of viewports and equipment ports for ancillary instruments such as ion sources for sample cleaning, thickness monitors and load lock entry.
A comprehensive PC control and data acquisition system is available as an option and also allows ancillary techniques and devices to be fully integrated.
Efficient water cooling and differentially pumped seals guarantee a base pressure of E-9 mbar which, together with sample manipulator options, provide the widest possible access to substrate conditions, including full 360 degree rotation with stage heating and cooling.
