Carl Zeiss has introduced the first multi-ion-beam tool based on Gas Field Ion Source (GFIS) technology.
The technology is an enhancement to the existing helium ion microscope, ORION NanoFab, which also utilises neon ions.
According to the company, the system can provide a complete sub-10 nanometer nanofabrication and sub-nanometer imaging solution.
An optional gallium focused ion beam (FIB) column can also be integrated.
The neon ion beam offers precise machining and nanofabrication capabilities due to higher sputter yields in ion beam milling and faster resist exposure in ion beam lithography.
The helium ion beam allows sub-10 nm nanofabrication as well as high resolution imaging capability in the same instrument.
