Carl Zeiss Microscopy has launched workshops on its scanning electron microscope (SEM) products.
Separate events will be held for the ZEISS Field Emission Scanning Electron Microscope (SIGMA, SUPRA, ULTRA & MERLIN Series), and the EVO, Series SEM.
Each hands-on workshop can be tailored to the particular SEM experience level of participants, and will include time for questions and hands-on practice using the participants’ samples.
The FE-SEM Series Workshop is a two day event that will be held from September 18-19 in New York.
The workshop includes a review of basic instrument principles, operations and parameter adjustments, a discussion of the effects of changing parameters on image quality, and an overview of the extensive software features available.
The two day EVO Series SEM Workshop will be held from July 10-11 in Massachusetts and September 18-19, 2013 in New York.
Fundamental principles of SEM parameters will be reviewed and discussed in the context of their effects on image quality.
A review of the EVO SEM’s operation, making parameter adjustments with the mouse, joystick, control panel, keyboard and tool bar icons functions, operations during the complete range of fundamental operating modes, and instrument cleaning and maintenance will also be covered.
Other topics vary depending upon the participants, and may include an extended pressure workshop, correlative microscopy, remote SEM operations, SEM automation, or STEM imaging.
