Instrument combines large sample handling capabilities with the image resolution normally associated with in-lens scanning electron microscopes
Hitachi High-Technologies says its S-4800 represents a breakthrough in Fesem technology, offering resolution figures of 1.0nm at 15kV yet capable of handling specimens up to 200mm (8") diameter.
The instrument combines large sample handling capabilities with the image resolution normally associated with in-lens scanning electron microscopes (SEMs) and can be seen for the first time in the UK at MicroScience 2004, 6-8 July 2004. Also on show will be the S-3600N variable pressure SEM, which will be on the PGT stand, H2.
The S-3600N is characterised by its extremely large specimen chamber and sampling handling capabilities.
The outstanding resolution of the S-4800 is achieved through a special objective lens design, combined with a high brightness cold cathode field emission electron source.
For beam-sensitive samples, a new beam deceleration option allows resolution of just 1.4nm to be achieved at 1kV.
To make the most of these resolution capabilities, the S-4800 features redesigned specimen stages and a dry pumping system using a turbomolecular pump to avoid contamination.
The S-4800 has exceptional signal collection capabilities through enhanced E X B filter technology which has been introduced to collect and separate the various signals giving topographical and compositional information.
The new E X B filter brings four times greater collection efficiency for low angle backscattered electrons, ensuring the production of outstanding backscattered electron images even at accelerating voltages below 2kV.
There is a choice of two specimen stages which allows specimens up to 8" diameter to be accommodated. All five axes on the larger stage are motorised and operate under graphical software control.
