The most demanding challenges of ultra-trace elemental analysis in semiconductor grade chemicals should be met by this small-footprint mass spectrometer
Accurate measurement of trace element contamination in semiconductor grade chemicals is arguably the most demanding application for today's analytical instrumentation.
The bench-top X Series, which has the smallest footprint of any ICP-MS in the world, delivers accurate measurement of trace element contamination in even the most aggressive and difficult to analyse matrices, including hydrofluoric acid, propan-2-ol, and other corrosive acids and organic materials.
Parts per quadrillion (ppq) detection limits are routinely measured using the new PlasmaScreen Plus technology, which offers enhanced analyte transmission, by up to a factor of five, while maintaining extremely low background levels.
Rapid switching from cool to hot plasma conditions gives ultimate detection limit capability for those elements such as Li, Na, K, Ca, and Fe which suffer from either high backgrounds or argon based polyatomic interferences.
Coupled with the latest Windows 2000 PlasmaLab software, automatic 'in sample' switching from cool to hot plasma conditions, eliminates the need to run samples twice under different conditions, giving a time and cost saving with the added benefit of reduced sample volume requirement. Additional options include collision cell technology, CCTED, for improved detection limits of high ionisation potential elements, such as As and Se, whilst the additional mass flow controller option allows the introduction of oxygen to the plasma for organics analysis, or a make-up gas to offer optimised cool plasma performance for low flow nebulisers.
The X Series ICP-MS has been designed to be robust, capable of analysing and processing large numbers of samples, 24 hours a day, 365 days a year, to meet the critical requirements of the semiconductor industry.
