Next-generation instrument, developed through a DTi-funded Link project, will be used to correlate microstructural properties of the thin films with magnetic and transport device-level performance
Oxford Nanoscience, manufacturer of the 3D atom probe (3DAP), will develop the Scanning Atom Probe as part of a UK Department of Trade and Industry (DTi)-funded initiative.
The company says the Scanning Atom Probe will be a next-generation instrument, designed to enable the routine testing of thin magnetic layered films both on wafer and micro-tip samples.
The new instrument will be used to correlate microstructural properties of the thin films with magnetic and transport device-level performance.
The company is participating in the Novel Atomic Scale Characterisation of Advanced Thin Film Structures (Naschars) project, funded by the DTI under the Link Information Storage Devices (ISD) scheme.
The other project partners will be Hitachi Global Storage Technologies, Department of Materials, University of Oxford, and Department of Physics, University of Durham.
The project uniquely brings Oxford Nanoscience together with a potential customer and two of the leading academic groups in the UK and has two key aspects.
These are to study technologically important thin film and nanostructured material systems to be used in next generation of magnetic recording heads, and to develop the Scanning Atom Probe in tandem with new sample preparation techniques.
The new instrument will allow the 3D atomic structure of the thin film structures to be obtained from significantly greater sample volumes than are currently achievable, with sample acquisition times of a couple of minutes.
The project will include the study of novel giant magnetoresistance (GMR) and tunnel magnetoresistance (TMR) structures that will lead to smaller read heads with a higher output signal.
