Jeol has introduced the JEM-ARM200F atomic resolution analytical microscope.
According to Jeol USA, the company's US subsidiary, the microscope sets a benchmark for advanced aberration-corrected S/TEM technology with the highest resolution commercially available in its class.
The microscope achieves a guaranteed high-angle annular dark field (HAADF)-STEM resolution of 80pm or 0.08nm.
With advanced analytical capabilities, the JEM-ARM200F enables both atom-by-atom imaging resolution and spatial resolution for atom-to-atom chemical mapping of materials, including energy-dispersive x-ray spectroscopy (EDS) and electron energy-loss spectroscopy (EELS).
The electron column design integrates S/TEM with Cs correction for atomic spatial energy resolution, combined with high probe currents for microanalysis.
The JEM-ARM200F is claimed to offer stability for imaging and analysis at the sub-nanometre scale.
The electron column is isolated from the environmental disturbances found in most laboratories.
A shielding design is intended to safeguard the ultra-high-powered optics from airflow, vibration and acoustical interference.
Additional shielding ensures protection from electronic interference, magnetic fields and thermal fluctuations.
The latest in software automation has been designed into the ARM200F, with tomography and holography simplified by a GUI.
The University of Texas at San Antonio (UTSA) will be the site of the first installation of the JEM-ARM200F.
The microscope will be housed in the Advanced Microscopy Laboratory under the supervision of researcher Miguel Yacaman, chair of the College of Science's Department of Physics and Astronomy.
It will support research in nanotechnology, materials science, medicine, biology, chemistry and engineering.
