The new A15/66 is capable of monitoring the entire dechlorination process with 'unparalleled' selectivity while considerably reducing chemical consumption
Analytical Technology (ATi) announces the launch of its novel A15/66 Residual Sulphite Ion Monitor for accurate and sensitive monitoring and control of de-chlorination and de-ozonisation of drinking or process water.
The new A15/66 is capable of monitoring the entire dechlorination process with 'unparalleled' selectivity while considerably reducing chemical consumption.
This innovative new instrument has been primarily developed to allow water treatment facilities to control the addition of sulphite compounds and guarantee complete removal of chlorine or ozone residuals in order to either comply with strict dechlorination regulations for waters discharged to rivers or estuaries or to protect chlorine or ozone sensitive plant and equipment such as GAC filters.
Removal of chlorine or ozone from water is commonly undertaken in the treatment of potable and process water.
A typical application is the removal of chlorine from town's or mains water prior to using reverse osmosis membranes.
Control is often achieved using a residual chlorine monitor; sulphite is added until the chlorine concentration is zero or low.
If instead of this a small excess of residual sulphite is maintained, three things are achieved.
With an excess of sulphite there is a guarantee that there is no ozone or chlorine in the water.
Controlling the sulphite to a small excess will also reduce costs by reducing overdosing.
The third benefit is that sulphite residuals are kept low.
In some process too much sulphite leads to the later production of sulphide compounds giving taste and odour problems.
ATi's new monitor allows direct, continuous measurement of sulphite residuals over ranges of either 0-2 or 0-20PPM.
An analog output from the monitor can be used to control the chemical feed system to maintain a safe residual sulphite concentration while reducing chemical expense to a minimum.
The new A15/66 residual sulphite ion monitor features two control relays, which are programmable for setpoint, deadband and time delay while also offering pulse frequency and pulse width modulation control modes in addition to simple on/off control for direct chemical feed pump modulation.
Furthermore, this revolutionary monitor has been equipped with a system that controls the automatic cleaning of sample inlet line.
