A one hundred times increase in energy dispersive spectrometer analysis sensitivity can be achieved by combining this technique with that of XRF generation
A one hundred times increase in energy dispersive spectrometer analysis sensitivity can be achieved by combining this technique with that of XRF generation in the scanning electron microscope, providing a relatively low cost means of obtaining this capability.
Selectable pure metal thin foils are placed under the electron beam by a precision collimated holder assembly and the resulting (XRF) flux then generates a complementary source of X-rays in the sample which are detected and analysed in the conventional way by the Si(Li) detector/analyser.
A detailed technical description of this technique is available on request and the trace element detection unit from Cambridge Technology Systems may be fitted to scanning microscopes with suitable chamber/stage geometry for less than œ5000.
Full XRF/EDS Systems can also be supplied by the company.
