National Physical Laboratory has completed and reported the full verification of the underlying theoretical basis for Farfield's dual polarisation interferometry (DPI) technology and measurements
Farfield Sensors reports that the National Physical Laboratory, Teddington, United Kingdom, has recently completed and reported the full verification of the underlying theoretical basis for Farfield's dual polarisation interferometry (DPI) technology and measurements.
Farfield markets first-generation DPI technology in its AnaLight instrument series for quantitative measurement of dynamic structural change at the molecular level for biophysical and nanotechnology applications.
The verification exercise was undertaken through the Department of Trade and Industry's National Measurement System Directorate Joint Industry Project (NMSD JIP) initiative and means that the basis of DPI's thin film measurements has now been confirmed by one of the world's leading independent centres of excellence in research, development and knowledge transfer in measurement and materials science.
For more than a century, NPL has developed and maintained the UK's primary measurement standards and ensured accuracy, consistency and innovation in physical measurement.
Neville Freeman, development director at Farfield Sensors commented: "Farfield is delighted to have received this prestigious endorsement.
"Combined with the host of other awards and recognition that DPI has received over the last two years, this again shows that Farfield's products are firmly rooted in the principles of quantitative, scientific measurement and analytical excellence".
