Thermo Electron announces the publication of a new brochure demonstrating its complete range of high performance systems for the semiconductor, microelectronics and disk storage industry
This eight-page brochure provides process and defect engineers, as well as production managers, with a quick reference to Thermo's capability offerings in the fields of plasma mass spectroscopy, FT-IR metrology, Raman microspectroscopy and numerous X-ray spectroscopies including angle-resolved XPS, microbeam XRF and EDS for electron microscopy and defect review.
The new brochure demonstrates Thermo's expertise in these manufacturing environments with specifically engineered instrumentation in both the support lab, and on the fab floor with near-line and at-line measurement and metrology tools that meet the rigorous demands of production monitoring.
The new brochure provides a review of the capabilities, characteristics, benefits and applications of this instrument family, and provides background regarding each instrument's underlying technique.
As yield management tools to monitor production parameters and locate defects become even more critical to the financial success of the fabrication units, and as wafer sizes grow to 300mm and feature sizes shrink to 45 nanometers, fast and reliable methods that accurately measure the chemistry and physical dimensions of silicon wafers and packaging are imperative.
Thermo offers several proven techniques for the production of semiconductor wafers, microchips, solid state circuitry and microelectronics.
Many of the semiconductor production monitoring tools from Thermo include wafer handling automation built to industry-standard guidelines and feature built-in automated analytical methods tied to production control and an information system.
As this brochure demonstrates, Thermo brings research quality instrumentation from the support lab to the fab floor in a variety of industry-leading measurement, metrology and production control solutions.
