Craic Technologies has introduced the QDI 2010 Film microspectrophotometer, which rapidly and non-destructively measures the thickness of thin films of sub-micron sampling areas.
The QDI 2010 Film can analyse films of many materials on transparent and opaque substrates.
It also enables the user to determine thin-film thickness on everything from semiconductors, MEMS devices, disk drives and flat panel displays.
The QDI 2010 Film can be combined with Craic Technologies' contamination imaging capabilities to make a solution specific to industrial processes.
The complete QDI 2010 Film solution combines advanced microspectroscopy with sophisticated software to enable the user to measure film thickness by either transmission or reflectance of many types of materials and substrates.
Sampling areas can range from more than 100 microns across to less than one micron.
The QDI 2010 Film incorporates a number of easily modified processing recipes, the ability to create new film recipes and sophisticated tools for analysing data.
The ability to directly image and analyse films with ultraviolet microscopy can be optionally added.
